Capabilities
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Wafer Size
100mm - 300mm
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Metals
< 1E10 / CM2
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TTV
< 1um
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LPD
> 32nm
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Processes
Strip & Etch, Lapping, Laser Scribe, Polish, Clean
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Capacity
100,000 wafers / month
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Removable Films
Cu, Ti, Fe, V, TiN, Cr, Al, Ta, SiO, Ti, Zr 100% inspection