LPCVD (Low Pressure Chemically Vapor Deposition) films are deposited on both sides of the substrate to provide excellent conformal coating, and high breakdown and dielectric isolation used in Semiconductor, Bio-Medical, MEMS and many more applications.
LPCVD (Low Pressure Chemically Vapor Deposition) are important films, deposited on both sides of the substrate, provide excellent conformal coating, high breakdown and dielectric isolation used in Semiconductor, Bio-Medical, MEMS and many more applications.
LPCVD Nitride, Stoichiometric 500A-3KA +/-5% (R.I. 2.0 +/-0.2) Deposition Temperature = 740 Degree C
| 50mm | 2 inch |
|---|---|
| 100mm | 4 inch |
| 125mm | 5 inch |
| 150mm | 6 inch |
| 200mm | 8 inch |
| 300mm | 12 inch |
WIWNU: Wafer-within-Wafer Non-Uniformity +/-5% @ Range
