PECVD (Plasma Enhanced Chemically Evaporated Deposition) are useful low temperature dielectrics that offer many applications ability to isolate metal layers
Noel operates 2 MRC Systems that provide 300mm and smaller diameter deposition of Titanium, Titanium Nitride, and Aluminum (99.999% Pure). Low Particle Processing utilizing a Vertical Palette Loading System. Used in Semiconductor, Bio-Medical, MEMS and many more applications.
Noel’s 2um Al is a pristine, shiny film, without haze.
| Ti | 200A to 3KA |
|---|---|
| TiN | 250A to 3KA |
| Al | 500A to 2um |
| 50mm | 2 inch |
|---|---|
| 100mm | 4 inch |
| 125mm | 5 inch |
| 150mm | 6 inch |
| 200mm | 8 inch |
| 300mm | 12 inch |
Film thickness is measured on an Alpha Step or P-15 Profiler, on a sample substrate or a coupon to confirm the thickness and tolerance.
